author_facet Kuang, X.
Tian, J.
Guo, H.
Hou, Y.
Zhang, H.
Liu, T.
Kuang, X.
Tian, J.
Guo, H.
Hou, Y.
Zhang, H.
Liu, T.
author Kuang, X.
Tian, J.
Guo, H.
Hou, Y.
Zhang, H.
Liu, T.
spellingShingle Kuang, X.
Tian, J.
Guo, H.
Hou, Y.
Zhang, H.
Liu, T.
Materiali in tehnologije
Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
Metals and Alloys
Polymers and Plastics
author_sort kuang, x.
spelling Kuang, X. Tian, J. Guo, H. Hou, Y. Zhang, H. Liu, T. 1580-2949 1580-3414 Institute of Metals and Technology Metals and Alloys Polymers and Plastics http://dx.doi.org/10.17222/mit.2017.006 Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing Materiali in tehnologije
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title Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_unstemmed Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_full Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_fullStr Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_full_unstemmed Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_short Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_sort feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
topic Metals and Alloys
Polymers and Plastics
url http://dx.doi.org/10.17222/mit.2017.006
publishDate 2018
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imprint Institute of Metals and Technology, 2018
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spelling Kuang, X. Tian, J. Guo, H. Hou, Y. Zhang, H. Liu, T. 1580-2949 1580-3414 Institute of Metals and Technology Metals and Alloys Polymers and Plastics http://dx.doi.org/10.17222/mit.2017.006 Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing Materiali in tehnologije
spellingShingle Kuang, X., Tian, J., Guo, H., Hou, Y., Zhang, H., Liu, T., Materiali in tehnologije, Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing, Metals and Alloys, Polymers and Plastics
title Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_full Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_fullStr Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_full_unstemmed Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_short Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_sort feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
title_unstemmed Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing
topic Metals and Alloys, Polymers and Plastics
url http://dx.doi.org/10.17222/mit.2017.006