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Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass
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| Zeitschriftentitel: | MATEC Web of Conferences |
|---|---|
| Personen und Körperschaften: | , , |
| In: | MATEC Web of Conferences, 143, 2018, S. 03006 |
| Format: | E-Article |
| Sprache: | Unbestimmt |
| veröffentlicht: |
EDP Sciences
|
| author_facet |
Zenin, Aleksey Klimov, Aleksandr Bakeev, Ilya Zenin, Aleksey Klimov, Aleksandr Bakeev, Ilya |
|---|---|
| author |
Zenin, Aleksey Klimov, Aleksandr Bakeev, Ilya |
| spellingShingle |
Zenin, Aleksey Klimov, Aleksandr Bakeev, Ilya MATEC Web of Conferences Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| author_sort |
zenin, aleksey |
| spelling |
Zenin, Aleksey Klimov, Aleksandr Bakeev, Ilya 2261-236X EDP Sciences http://dx.doi.org/10.1051/matecconf/201814303006 <jats:p>The paper gives overview of the results of using narrow-aperture electron beam generated by a forevacuum plasma electron source as a tool for treatment of electrically non-conductive materials, such as technical glass. Effectiveness of electron beam treatment of non-conductive materials is caused by almost complete neutralization of target charge on the treated surface. Charge neutralization occurs due to ion flow from beam plasma generated while transporting the beam through forevacuum pressure area. The study demonstrates the possibility to control depth and form of milling by changing modes of electron beam treatment. Combined use of electron beam and automated system for beam deflection and sweep makes possible to perform dimensional processing, particularly cutting and milling with complex trajectory. Milling rates were experimentally found depending on treatment time and mode. The suggested method of silica glass treatment represents an alternative for traditional treatment methods.</jats:p> Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass MATEC Web of Conferences |
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| title |
Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_unstemmed |
Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_full |
Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_fullStr |
Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_full_unstemmed |
Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_short |
Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_sort |
narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
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http://dx.doi.org/10.1051/matecconf/201814303006 |
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2018 |
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03006 |
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<jats:p>The paper gives overview of the results of using narrow-aperture electron beam generated by a forevacuum plasma electron source as a tool for treatment of electrically non-conductive materials, such as technical glass. Effectiveness of electron beam treatment of non-conductive materials is caused by almost complete neutralization of target charge on the treated surface. Charge neutralization occurs due to ion flow from beam plasma generated while transporting the beam through forevacuum pressure area. The study demonstrates the possibility to control depth and form of milling by changing modes of electron beam treatment. Combined use of electron beam and automated system for beam deflection and sweep makes possible to perform dimensional processing, particularly cutting and milling with complex trajectory. Milling rates were experimentally found depending on treatment time and mode. The suggested method of silica glass treatment represents an alternative for traditional treatment methods.</jats:p> |
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| author | Zenin, Aleksey, Klimov, Aleksandr, Bakeev, Ilya |
| author_facet | Zenin, Aleksey, Klimov, Aleksandr, Bakeev, Ilya, Zenin, Aleksey, Klimov, Aleksandr, Bakeev, Ilya |
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| description | <jats:p>The paper gives overview of the results of using narrow-aperture electron beam generated by a forevacuum plasma electron source as a tool for treatment of electrically non-conductive materials, such as technical glass. Effectiveness of electron beam treatment of non-conductive materials is caused by almost complete neutralization of target charge on the treated surface. Charge neutralization occurs due to ion flow from beam plasma generated while transporting the beam through forevacuum pressure area. The study demonstrates the possibility to control depth and form of milling by changing modes of electron beam treatment. Combined use of electron beam and automated system for beam deflection and sweep makes possible to perform dimensional processing, particularly cutting and milling with complex trajectory. Milling rates were experimentally found depending on treatment time and mode. The suggested method of silica glass treatment represents an alternative for traditional treatment methods.</jats:p> |
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| spelling | Zenin, Aleksey Klimov, Aleksandr Bakeev, Ilya 2261-236X EDP Sciences http://dx.doi.org/10.1051/matecconf/201814303006 <jats:p>The paper gives overview of the results of using narrow-aperture electron beam generated by a forevacuum plasma electron source as a tool for treatment of electrically non-conductive materials, such as technical glass. Effectiveness of electron beam treatment of non-conductive materials is caused by almost complete neutralization of target charge on the treated surface. Charge neutralization occurs due to ion flow from beam plasma generated while transporting the beam through forevacuum pressure area. The study demonstrates the possibility to control depth and form of milling by changing modes of electron beam treatment. Combined use of electron beam and automated system for beam deflection and sweep makes possible to perform dimensional processing, particularly cutting and milling with complex trajectory. Milling rates were experimentally found depending on treatment time and mode. The suggested method of silica glass treatment represents an alternative for traditional treatment methods.</jats:p> Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass MATEC Web of Conferences |
| spellingShingle | Zenin, Aleksey, Klimov, Aleksandr, Bakeev, Ilya, MATEC Web of Conferences, Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title | Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_full | Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_fullStr | Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_full_unstemmed | Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_short | Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_sort | narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| title_unstemmed | Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass |
| url | http://dx.doi.org/10.1051/matecconf/201814303006 |