Eintrag weiter verarbeiten
Verfügbar über lokaler Bestand

Nanoimprint lithography: principles, processes and materials

Gespeichert in:

Personen und Körperschaften: Lan, Hongbo (VerfasserIn), Ding, Yucheng (VerfasserIn), Liu, Hongzhong (VerfasserIn)
Titel: Nanoimprint lithography: principles, processes and materials/ Hongbo Lan, Yucheng Ding and Hongzhong Liu
Format: Buch Bibliografie
Sprache: Englisch
veröffentlicht:
[Hauppauge], NY Nova Science Publishers c 2011
Gesamtaufnahme: Nanotechnology science and technology
Schlagwörter:
Nanolithography
Nanoelectronics
Microlithography
Nanostructures
Bibliografie
Quelle: Verbunddaten SWB
LEADER 02752cam a2200697 4500
001 0-63665074X
003 DE-627
005 20220708144108.0
007 tu
008 101013s2011 xxu||||| b 00| ||eng c
010 |a  2010038653 
016 7 |a 015869444  |2 UK 
020 |a 9781611225013  |c (pbk.) £35.99  |9 978-1-61122-501-3 
020 |a 1611225019  |c (pbk.) £35.99  |9 1-61122-501-9 
035 |a (DE-627)63665074X 
035 |a (DE-576)369442776 
035 |a (DE-599)GBV63665074X 
035 |a (OCoLC)809042913 
035 |a (OCoLC)809042913 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
044 |c XD-US 
050 0 |a TK7874.84 
082 0 |a 621.3815/31  |q LOC  |2 22 
082 0 |a 621.381531 
084 |a ZN 3700  |2 rvk  |0 (DE-625)rvk/157333: 
084 |a 53.56  |2 bkl 
100 1 |a Lan, Hongbo  |0 (DE-588)136583962  |0 (DE-627)584356927  |0 (DE-576)301093555  |4 aut 
245 1 0 |a Nanoimprint lithography  |b principles, processes and materials  |c Hongbo Lan, Yucheng Ding and Hongzhong Liu 
264 1 |a [Hauppauge], NY  |b Nova Science Publishers  |c c 2011 
300 |a VIII, 73 S.  |b Ill.  |c 23 cm 
336 |a Text  |b txt  |2 rdacontent 
337 |a ohne Hilfsmittel zu benutzen  |b n  |2 rdamedia 
338 |a Band  |b nc  |2 rdacarrier 
490 0 |a Nanotechnology science and technology 
500 |a Includes bibliographical references (p. [61]-68) and index 
505 8 0 |a Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL. 
520 |a Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL 
650 0 |a Nanolithography 
650 0 |a Nanoelectronics 
650 0 |a Microlithography 
650 0 |a Nanostructures 
653 4 |a Nanoelectronics 
653 4 |a Microlithography 
653 4 |a Nanostructures 
655 7 |a Bibliografie  |0 (DE-588)4006432-3  |0 (DE-627)104814519  |0 (DE-576)208865578  |2 gnd-content 
700 1 |a Ding, Yucheng  |0 (DE-588)136583997  |0 (DE-627)584357028  |0 (DE-576)301093571  |4 aut 
700 1 |a Liu, Hongzhong  |d 1971-  |4 aut 
935 |i Blocktest 
936 r v |a ZN 3700  |b Mikromechanik (hier auch Nanotechnologie)  |k Elektrotechnik, Elektronik, Nachrichtentechnik  |k Elektromechanik und Mikromechanik  |k Mikromechanik (hier auch Nanotechnologie)  |0 (DE-627)1271730413  |0 (DE-625)rvk/157333:  |0 (DE-576)201730413 
936 b k |a 53.56  |j Halbleitertechnologie  |0 (DE-627)106418688 
951 |a BO 
983 |a (DE-Zwi2)500172098 
975 |c B 
852 |a DE-Zwi2  |z 2012-08-13T14:46:10Z  |x 2021-01-27 
975 |o 86 972 
900 |a Hongbo, Lan 
900 |a Hongbo Lan 
900 |a Yucheng, Ding 
900 |a Yucheng Ding 
980 |a 63665074X  |b 0  |k 63665074X  |o 369442776 
openURL url_ver=Z39.88-2004&ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fvufind.svn.sourceforge.net%3Agenerator&rft.title=Nanoimprint+lithography%3A+principles%2C+processes+and+materials&rft.date=c+2011&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Abook&rft.genre=book&rft.btitle=Nanoimprint+lithography%3A+principles%2C+processes+and+materials&rft.series=Nanotechnology+science+and+technology&rft.au=Lan%2C+Hongbo&rft.pub=Nova+Science+Publishers&rft.edition=&rft.isbn=1611225019
SOLR
_version_ 1750511134741364736
access_facet Local Holdings
author Lan, Hongbo, Ding, Yucheng, Liu, Hongzhong
author_facet Lan, Hongbo, Ding, Yucheng, Liu, Hongzhong
author_role aut, aut, aut
author_sort Lan, Hongbo
author_variant h l hl, y d yd, h l hl
barcode_dezwi2 00371394
branch_dezwi2 Hauptbibliothek
callnumber-first T - Technology
callnumber-label TK7874
callnumber-raw TK7874.84
callnumber-search TK7874.84
callnumber-sort TK 47874.84
callnumber-subject TK - Electrical and Nuclear Engineering
callnumber_dezwi2 ZN 3700 L243, 86 972 ZN 3700 L243
collcode_dezwi2 Freihand
contents Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL., Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL
ctrlnum (DE-627)63665074X, (DE-576)369442776, (DE-599)GBV63665074X, (OCoLC)809042913
dewey-full 621.3815/31, 621.381531
dewey-hundreds 600 - Technology
dewey-ones 621 - Applied physics
dewey-raw 621.3815/31, 621.381531
dewey-search 621.3815/31, 621.381531
dewey-sort 3621.3815 231
dewey-tens 620 - Engineering
facet_avail Local
facet_topic_nrw_music Nanoelectronics, Microlithography, Nanostructures
finc_class_facet Technik
finc_id_str 0004764230
fincclass_txtF_mv technology, engineering-electrical, engineering-process
footnote Includes bibliographical references (p. [61]-68) and index
format Book, Bibliography
format_access_txtF_mv Book, E-Book
format_de14 Book, E-Book
format_de15 Book, E-Book
format_del152 Buch
format_detail_txtF_mv text-print-monograph-independent-bibliography
format_dezi4 e-Book
format_dezwi2 Book
format_finc Book, E-Book
format_legacy Book
format_legacy_nrw Book, E-Book
format_nrw Book, E-Book
format_strict_txtF_mv Book
genre Bibliografie (DE-588)4006432-3 (DE-627)104814519 (DE-576)208865578 gnd-content
genre_facet Bibliografie
geogr_code not assigned
geogr_code_person not assigned
id 0-63665074X
illustrated Illustrated
imprint [Hauppauge], NY, Nova Science Publishers, c 2011
imprint_str_mv [Hauppauge], NY: Nova Science Publishers, c 2011
institution DE-Zwi2
is_hierarchy_id
is_hierarchy_title
isbn 9781611225013, 1611225019
isil_str_mv DE-Zwi2
kxp_id_str 63665074X
language English
last_indexed 2022-11-25T23:05:09.448Z
lccn 2010038653
local_heading_facet_dezwi2 Nanolithography, Nanoelectronics, Microlithography, Nanostructures
match_str lan2011nanoimprintlithographyprinciplesprocessesandmaterials
mega_collection Verbunddaten SWB
names_id_str_mv (DE-588)136583962, (DE-627)584356927, (DE-576)301093555, (DE-588)136583997, (DE-627)584357028, (DE-576)301093571
oclc_num 809042913
physical VIII, 73 S.; Ill; 23 cm
publishDate c 2011
publishDateSort 2011
publishPlace [Hauppauge], NY
publisher Nova Science Publishers
record_format marcfinc
record_id 369442776
recordtype marcfinc
rvk_facet ZN 3700
rvk_label Elektrotechnik, Elektronik, Nachrichtentechnik, Elektromechanik und Mikromechanik, Mikromechanik (hier auch Nanotechnologie)
rvk_path ZN, ZN 3700, ZN 3600 - ZN 3750, ZG - ZS
rvk_path_str_mv ZN, ZN 3700, ZN 3600 - ZN 3750, ZG - ZS
series2 Nanotechnology science and technology
source_id 0
spelling Lan, Hongbo (DE-588)136583962 (DE-627)584356927 (DE-576)301093555 aut, Nanoimprint lithography principles, processes and materials Hongbo Lan, Yucheng Ding and Hongzhong Liu, [Hauppauge], NY Nova Science Publishers c 2011, VIII, 73 S. Ill. 23 cm, Text txt rdacontent, ohne Hilfsmittel zu benutzen n rdamedia, Band nc rdacarrier, Nanotechnology science and technology, Includes bibliographical references (p. [61]-68) and index, Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL., Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL, Nanolithography, Nanoelectronics, Microlithography, Nanostructures, Bibliografie (DE-588)4006432-3 (DE-627)104814519 (DE-576)208865578 gnd-content, Ding, Yucheng (DE-588)136583997 (DE-627)584357028 (DE-576)301093571 aut, Liu, Hongzhong 1971- aut, DE-Zwi2 2012-08-13T14:46:10Z 2021-01-27
spellingShingle Lan, Hongbo, Ding, Yucheng, Liu, Hongzhong, Nanoimprint lithography: principles, processes and materials, Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL., Principle and fundamental process for NIL -- Variations of NIL processes -- NIL materials -- Prospects and challenges in NIL, Nanolithography, Nanoelectronics, Microlithography, Nanostructures, Bibliografie
swb_id_str 369442776
title Nanoimprint lithography: principles, processes and materials
title_auth Nanoimprint lithography principles, processes and materials
title_full Nanoimprint lithography principles, processes and materials Hongbo Lan, Yucheng Ding and Hongzhong Liu
title_fullStr Nanoimprint lithography principles, processes and materials Hongbo Lan, Yucheng Ding and Hongzhong Liu
title_full_unstemmed Nanoimprint lithography principles, processes and materials Hongbo Lan, Yucheng Ding and Hongzhong Liu
title_short Nanoimprint lithography
title_sort nanoimprint lithography principles processes and materials
title_sub principles, processes and materials
topic Nanolithography, Nanoelectronics, Microlithography, Nanostructures, Bibliografie
topic_facet Nanolithography, Nanoelectronics, Microlithography, Nanostructures, Bibliografie