Effect of aromatic precursor flow rate on morphology and properties of carbon nanostructures in plasma enhanced chemical vapor deposition

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Published in:	RSC advances 6 (2016), 32779-32788
Authors and Corporations:	Lehmann, Karsten (Author), Yurchenko, Olena (Author), Urban, Gerald A. (Author)
Title:	Effect of aromatic precursor flow rate on morphology and properties of carbon nanostructures in plasma enhanced chemical vapor deposition/ K. Lehmann, O. Yurchenko, G. Urban
Type of Resource:	E-Book Special Print
Language:	English
published:	London RSC Publishing 2016 Freiburg Albert-Ludwigs-Universität Freiburg 2017
Series:	Effect of aromatic precursor flow rate on morphology and properties of carbon nanostructures in plasma enhanced chemical vapor deposition; 6 (2016), 32779-32788
Source:	Verbunddaten SWB Lizenzfreie Online-Ressourcen

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