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Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures...
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| Zeitschriftentitel: | Beilstein Journal of Nanotechnology |
|---|---|
| Personen und Körperschaften: | , , , , , |
| In: | Beilstein Journal of Nanotechnology, 5, 2014, S. 577-586 |
| Format: | E-Article |
| Sprache: | Englisch |
| veröffentlicht: |
Beilstein Institut
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| Schlagwörter: |
| author_facet |
Zhao, Jun Frank, Bettina Neubrech, Frank Zhang, Chunjie Braun, Paul V Giessen, Harald Zhao, Jun Frank, Bettina Neubrech, Frank Zhang, Chunjie Braun, Paul V Giessen, Harald |
|---|---|
| author |
Zhao, Jun Frank, Bettina Neubrech, Frank Zhang, Chunjie Braun, Paul V Giessen, Harald |
| spellingShingle |
Zhao, Jun Frank, Bettina Neubrech, Frank Zhang, Chunjie Braun, Paul V Giessen, Harald Beilstein Journal of Nanotechnology Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials Electrical and Electronic Engineering General Physics and Astronomy General Materials Science |
| author_sort |
zhao, jun |
| spelling |
Zhao, Jun Frank, Bettina Neubrech, Frank Zhang, Chunjie Braun, Paul V Giessen, Harald 2190-4286 Beilstein Institut Electrical and Electronic Engineering General Physics and Astronomy General Materials Science http://dx.doi.org/10.3762/bjnano.5.68 <jats:p>Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication process step by step. We manufacture a variety of different plasmonic structures ranging from simple nano-antennas over complex chiral structures to stacked composite materials for applications such as sensing. Additionally, we give details on the control of the nanostructure lateral density which allows for the multilayer-fabrication of complex nanostructures. In two accompanying movies, the fabrication strategy is explained and details are being demonstrated in the lab. The movies can be found at the website of Beilstein TV.</jats:p> Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials Beilstein Journal of Nanotechnology |
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Beilstein Institut, 2014 |
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Beilstein Institut, 2014 |
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| title |
Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_unstemmed |
Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_full |
Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_fullStr |
Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_full_unstemmed |
Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_short |
Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_sort |
hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: a versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| topic |
Electrical and Electronic Engineering General Physics and Astronomy General Materials Science |
| url |
http://dx.doi.org/10.3762/bjnano.5.68 |
| publishDate |
2014 |
| physical |
577-586 |
| description |
<jats:p>Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication process step by step. We manufacture a variety of different plasmonic structures ranging from simple nano-antennas over complex chiral structures to stacked composite materials for applications such as sensing. Additionally, we give details on the control of the nanostructure lateral density which allows for the multilayer-fabrication of complex nanostructures. In two accompanying movies, the fabrication strategy is explained and details are being demonstrated in the lab. The movies can be found at the website of Beilstein TV.</jats:p> |
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| author | Zhao, Jun, Frank, Bettina, Neubrech, Frank, Zhang, Chunjie, Braun, Paul V, Giessen, Harald |
| author_facet | Zhao, Jun, Frank, Bettina, Neubrech, Frank, Zhang, Chunjie, Braun, Paul V, Giessen, Harald, Zhao, Jun, Frank, Bettina, Neubrech, Frank, Zhang, Chunjie, Braun, Paul V, Giessen, Harald |
| author_sort | zhao, jun |
| container_start_page | 577 |
| container_title | Beilstein Journal of Nanotechnology |
| container_volume | 5 |
| description | <jats:p>Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication process step by step. We manufacture a variety of different plasmonic structures ranging from simple nano-antennas over complex chiral structures to stacked composite materials for applications such as sensing. Additionally, we give details on the control of the nanostructure lateral density which allows for the multilayer-fabrication of complex nanostructures. In two accompanying movies, the fabrication strategy is explained and details are being demonstrated in the lab. The movies can be found at the website of Beilstein TV.</jats:p> |
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| imprint | Beilstein Institut, 2014 |
| imprint_str_mv | Beilstein Institut, 2014 |
| institution | DE-D275, DE-Bn3, DE-Brt1, DE-Zwi2, DE-D161, DE-Gla1, DE-Zi4, DE-15, DE-Pl11, DE-Rs1, DE-105, DE-14, DE-Ch1, DE-L229 |
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| physical | 577-586 |
| publishDate | 2014 |
| publishDateSort | 2014 |
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| series | Beilstein Journal of Nanotechnology |
| source_id | 49 |
| spelling | Zhao, Jun Frank, Bettina Neubrech, Frank Zhang, Chunjie Braun, Paul V Giessen, Harald 2190-4286 Beilstein Institut Electrical and Electronic Engineering General Physics and Astronomy General Materials Science http://dx.doi.org/10.3762/bjnano.5.68 <jats:p>Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication process step by step. We manufacture a variety of different plasmonic structures ranging from simple nano-antennas over complex chiral structures to stacked composite materials for applications such as sensing. Additionally, we give details on the control of the nanostructure lateral density which allows for the multilayer-fabrication of complex nanostructures. In two accompanying movies, the fabrication strategy is explained and details are being demonstrated in the lab. The movies can be found at the website of Beilstein TV.</jats:p> Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials Beilstein Journal of Nanotechnology |
| spellingShingle | Zhao, Jun, Frank, Bettina, Neubrech, Frank, Zhang, Chunjie, Braun, Paul V, Giessen, Harald, Beilstein Journal of Nanotechnology, Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials, Electrical and Electronic Engineering, General Physics and Astronomy, General Materials Science |
| title | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_full | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_fullStr | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_full_unstemmed | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_short | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_sort | hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: a versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| title_unstemmed | Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials |
| topic | Electrical and Electronic Engineering, General Physics and Astronomy, General Materials Science |
| url | http://dx.doi.org/10.3762/bjnano.5.68 |