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Texture Control in Thin Films Using Ion Bombardment
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| Zeitschriftentitel: | Textures and Microstructures |
|---|---|
| Personen und Körperschaften: | , , |
| In: | Textures and Microstructures, 34, 2000, 2-3, S. 105-118 |
| Format: | E-Article |
| Sprache: | Englisch |
| veröffentlicht: |
Hindawi Limited
|
| Schlagwörter: |
| author_facet |
Was, G. S. Ji, H. Ma, Z. Was, G. S. Ji, H. Ma, Z. |
|---|---|
| author |
Was, G. S. Ji, H. Ma, Z. |
| spellingShingle |
Was, G. S. Ji, H. Ma, Z. Textures and Microstructures Texture Control in Thin Films Using Ion Bombardment General Engineering |
| author_sort |
was, g. s. |
| spelling |
Was, G. S. Ji, H. Ma, Z. 0730-3300 1029-4961 Hindawi Limited General Engineering http://dx.doi.org/10.1155/tsm.34.105 <jats:p>The development of texture in thin films under ion bombardment is believed to occur due to the preferential growth of the aligned grains in the film relative to the unaligned grains. The difference in growth rates between aligned and unaligned grains results in the development of texture with increasing thickness. Both out-of-plane (fiber) and in-plane texture can be controlled during ion bombardment. Experiments were performed to create a (110) out-of-plane texture in thin aluminum films and to create a (110) in-plane texture in niobium films. Results showed that the texture in both cases increases in strength with depth, and that for 500 nm Al films, the (110) texture was stronger than the thermodynamically-preferred (111) texture obtained by physical vapor deposition. Results confirm a texturing mechanism based on ion channeling and preferential sputtering.</jats:p> Texture Control in Thin Films Using Ion Bombardment Textures and Microstructures |
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| imprint |
Hindawi Limited, 2000 |
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Hindawi Limited, 2000 |
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0730-3300 1029-4961 |
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0730-3300 1029-4961 |
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2000 |
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Hindawi Limited |
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Textures and Microstructures |
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49 |
| title |
Texture Control in Thin Films Using Ion Bombardment |
| title_unstemmed |
Texture Control in Thin Films Using Ion Bombardment |
| title_full |
Texture Control in Thin Films Using Ion Bombardment |
| title_fullStr |
Texture Control in Thin Films Using Ion Bombardment |
| title_full_unstemmed |
Texture Control in Thin Films Using Ion Bombardment |
| title_short |
Texture Control in Thin Films Using Ion Bombardment |
| title_sort |
texture control in thin films using ion bombardment |
| topic |
General Engineering |
| url |
http://dx.doi.org/10.1155/tsm.34.105 |
| publishDate |
2000 |
| physical |
105-118 |
| description |
<jats:p>The development of texture in thin films under ion bombardment is believed to occur due to
the preferential growth of the aligned grains in the film relative to the unaligned grains. The
difference in growth rates between aligned and unaligned grains results in the development
of texture with increasing thickness. Both out-of-plane (fiber) and in-plane texture can be
controlled during ion bombardment. Experiments were performed to create a (110) out-of-plane
texture in thin aluminum films and to create a (110) in-plane texture in niobium films.
Results showed that the texture in both cases increases in strength with depth, and that for
500 nm Al films, the (110) texture was stronger than the thermodynamically-preferred (111)
texture obtained by physical vapor deposition. Results confirm a texturing mechanism
based on ion channeling and preferential sputtering.</jats:p> |
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| author | Was, G. S., Ji, H., Ma, Z. |
| author_facet | Was, G. S., Ji, H., Ma, Z., Was, G. S., Ji, H., Ma, Z. |
| author_sort | was, g. s. |
| container_issue | 2-3 |
| container_start_page | 105 |
| container_title | Textures and Microstructures |
| container_volume | 34 |
| description | <jats:p>The development of texture in thin films under ion bombardment is believed to occur due to the preferential growth of the aligned grains in the film relative to the unaligned grains. The difference in growth rates between aligned and unaligned grains results in the development of texture with increasing thickness. Both out-of-plane (fiber) and in-plane texture can be controlled during ion bombardment. Experiments were performed to create a (110) out-of-plane texture in thin aluminum films and to create a (110) in-plane texture in niobium films. Results showed that the texture in both cases increases in strength with depth, and that for 500 nm Al films, the (110) texture was stronger than the thermodynamically-preferred (111) texture obtained by physical vapor deposition. Results confirm a texturing mechanism based on ion channeling and preferential sputtering.</jats:p> |
| doi_str_mv | 10.1155/tsm.34.105 |
| facet_avail | Online, Free |
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| id | ai-49-aHR0cDovL2R4LmRvaS5vcmcvMTAuMTE1NS90c20uMzQuMTA1 |
| imprint | Hindawi Limited, 2000 |
| imprint_str_mv | Hindawi Limited, 2000 |
| institution | DE-Bn3, DE-Brt1, DE-D161, DE-Zwi2, DE-Gla1, DE-Zi4, DE-15, DE-Pl11, DE-Rs1, DE-105, DE-14, DE-Ch1, DE-L229, DE-D275 |
| issn | 0730-3300, 1029-4961 |
| issn_str_mv | 0730-3300, 1029-4961 |
| language | English |
| last_indexed | 2024-03-01T16:41:48.268Z |
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| physical | 105-118 |
| publishDate | 2000 |
| publishDateSort | 2000 |
| publisher | Hindawi Limited |
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| recordtype | ai |
| series | Textures and Microstructures |
| source_id | 49 |
| spelling | Was, G. S. Ji, H. Ma, Z. 0730-3300 1029-4961 Hindawi Limited General Engineering http://dx.doi.org/10.1155/tsm.34.105 <jats:p>The development of texture in thin films under ion bombardment is believed to occur due to the preferential growth of the aligned grains in the film relative to the unaligned grains. The difference in growth rates between aligned and unaligned grains results in the development of texture with increasing thickness. Both out-of-plane (fiber) and in-plane texture can be controlled during ion bombardment. Experiments were performed to create a (110) out-of-plane texture in thin aluminum films and to create a (110) in-plane texture in niobium films. Results showed that the texture in both cases increases in strength with depth, and that for 500 nm Al films, the (110) texture was stronger than the thermodynamically-preferred (111) texture obtained by physical vapor deposition. Results confirm a texturing mechanism based on ion channeling and preferential sputtering.</jats:p> Texture Control in Thin Films Using Ion Bombardment Textures and Microstructures |
| spellingShingle | Was, G. S., Ji, H., Ma, Z., Textures and Microstructures, Texture Control in Thin Films Using Ion Bombardment, General Engineering |
| title | Texture Control in Thin Films Using Ion Bombardment |
| title_full | Texture Control in Thin Films Using Ion Bombardment |
| title_fullStr | Texture Control in Thin Films Using Ion Bombardment |
| title_full_unstemmed | Texture Control in Thin Films Using Ion Bombardment |
| title_short | Texture Control in Thin Films Using Ion Bombardment |
| title_sort | texture control in thin films using ion bombardment |
| title_unstemmed | Texture Control in Thin Films Using Ion Bombardment |
| topic | General Engineering |
| url | http://dx.doi.org/10.1155/tsm.34.105 |