Otani, K.(2013). Effects of magnetic flux density and substrate temperature on Ni films prepared by means of unbalanced magnetron sputtering assisted by inductively coupled plasma. Journal of Physics: Conference Series, 417, 012035. doi:10.1088/1742-6596/417/1/012035
MLA ZitierstilOtani, K. "Effects of Magnetic Flux Density and Substrate Temperature On Ni Films Prepared By Means of Unbalanced Magnetron Sputtering Assisted By Inductively Coupled Plasma". Journal of Physics: Conference Series, 417 ( 2013 ): 012035.
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