SHINANO, Y.(2009). Optimization of Lens Adjustment in Semiconductor Lithography Equipment Using Quadratically Constrained and Second Order Cone Programming(Mechanical Systems). Transactions of the Japan Society of Mechanical Engineers Series C, 75(749), 157-163. doi:10.1299/kikaic.75.157
MLA ZitierstilSHINANO, Yuji. "Optimization of Lens Adjustment in Semiconductor Lithography Equipment Using Quadratically Constrained and Second Order Cone Programming(Mechanical Systems)". Transactions of the Japan Society of Mechanical Engineers Series C, 75.749 ( 2009 ): 157-163.
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