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Metamaterial emitter for thermophotovoltaics stable up to 1400 °C
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Veröffentlicht in: | Scientific reports 9(2019, 1), Artikel-Nummer 7241, 11 Seiten |
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Personen und Körperschaften: | , , , , , , , , , , , , |
Titel: | Metamaterial emitter for thermophotovoltaics stable up to 1400 °C/ Manohar Chirumamilla, Gnanavel Vaidhyanathan Krishnamurthy, Katrin Knopp, Tobias Krekeler, Matthias Graf, Dirk Jalas, Martin Ritter, Michael Störmer, Alexander Yu Petrov & Manfred Eich |
Format: | E-Book-Kapitel |
Sprache: | Englisch |
veröffentlicht: |
10 may 2019
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Gesamtaufnahme: |
: Scientific reports, 9(2019, 1), Artikel-Nummer 7241, 11 Seiten
, volume:9 |
Schlagwörter: | |
Quelle: | Verbunddaten SWB Lizenzfreie Online-Ressourcen |
Zusammenfassung: | High temperature stable selective emitters can significantly increase efficiency and radiative power in thermophotovoltaic (TPV) systems. However, optical properties of structured emitters reported so far degrade at temperatures approaching 1200 °C due to various degradation mechanisms. We have realized a 1D structured emitter based on a sputtered W-HfO 2 layered metamaterial and demonstrated desired band edge spectral properties at 1400 °C. To the best of our knowledge the temperature of 1400 °C is the highest reported for a structured emitter, so far. The spatial confinement and absence of edges stabilizes the W-HfO 2 multilayer system to temperatures unprecedented for other nanoscaled W-structures. Only when this confinement is broken W starts to show the well-known self-diffusion behavior transforming to spherical shaped W-islands. We further show that the oxidation of W by atmospheric oxygen could be prevented by reducing the vacuum pressure below 10 −5 mbar. When oxidation is mitigated we observe that the 20 nm spatially confined W films survive temperatures up to 1400 °C. The demonstrated thermal stability is limited by grain growth in HfO 2 , which leads to a rupture of the W-layers, thus, to a degradation of the multilayer system at 1450 °C. |
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Beschreibung: |
Sonstige Körperschaft: Technische Universität Hamburg Sonstige Körperschaft: Technische Universität Hamburg, Institut für Optische und Elektronische Materialien Sonstige Körperschaft: SFB Maßgeschneiderte Multiskalige Materialsystem M3 |
Umfang: |
llustrationen, Diagramme 11 |
ISSN: |
2045-2322
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DOI: | 10.15480/882.2275 |